System/Model
|
LP-1100 EBA
|
Chamber Size
|
Diameter
|
1100 mm
|
Substrate-Dome
|
∮950 mm
|
Main Performance
|
Ultimate Pressure
|
Better than 10-6 Torr
|
Operation Pressure
|
From 1 atm to 2x10-5 Torr within 30 minutes (unloading)
|
Substrate Temp
|
350℃ (Max)
|
Pumping System
|
Rotary Pump
|
3,000 L/min
|
Booster Pump
|
600 M3/ hour
|
Diffusion Pump
|
15,000 L/ sec x 2
|
Meissner Trap
|
Cryogenic Refrigerator (-110 ~ -140℃)
|
Heating System
|
Micro Heater
|
12KW
|
Layer Monitoring System
|
Optical Monitor
|
LP Broad Band Monitor
|
Crystal Monitor
|
Single Sensor/ Six-pcs Sensor Head
|
Vacuum Gauge
|
Pirani (760 ~10-3 Torr); Cold Cathode (10-3 ~ 10-6 Torr)
|
Evaporation Source
|
E-Beam
|
Plasmatech 6KW/10KW
|
Thermal
|
6KW
|
Rotation System
|
|
Planetary or Dome
|
Ion Source
|
|
Optical
|
Cooling water flow rate
|
|
100 L/min
|
Cooling Tower
|
|
Water Pressure: 4kg/ cm2; Pressure Drop: 2kg/ cm2
|
Cooling Water
|
|
Inlet: 18℃; Outlet: 25℃; Standard: 20±1℃
|
Polycold
|
|
Option
|
Air Compressor
|
|
3HP (Air Pressure: 6 ~ 8 kg/ cm2)
|
Grounding Resistance
|
|
Under 5Ω
|
Electrical Control System
|
|
PLC,PC (Windows system)
|
Total Power Requirement
|
|
40KW
|
Environment Requirement
|
Clean Room(ISO Class 5); Exopy Flooring; Air-conditioning; Temp.25±3℃; HUM50±10% |