System/Model
|
LP-1800 EBA
|
Chamber Size
|
Diameter
|
1,800 mm
|
Substrate-Dome
|
∮1,600 mm
|
Main Performance
|
Ultimate Pressure
|
Better than 10-6 Torr
|
Operation Pressure
|
From 1 atm to 2x10-5 Torr within 30 minutes (unloading)
|
Substrate Temp
|
350℃ (Max)
|
Pumping System
|
Rotary Pump
|
6,000 L/min
|
Booster Pump
|
2,600 M3/ hour
|
Diffusion Pump
|
45,000L/ secx2
|
Meissner Trap
|
Cryogenic Refrigerator (-90 ~ -140℃)
|
Heating System
|
Micro Heater
|
42KW
|
Layer Monitoring System
|
Optical Monitor
|
LP Broad Band Monitor
|
Crystal Monitor
|
Single Sensor/ Six-pcs Sensor Head
|
Vacuum Gauge
|
Pirani (760 ~10-3 Torr); Cold Cathode (10-3 ~ 10-6 Torr)
|
Evaporation Source
|
E-Beam
|
JEOL / Plasmatech 6KW/10KW
|
ERH/ Thermal
|
6KW
|
Rotation System
|
|
Planetary or Dome
|
Ion Source
|
|
Optical
|
Plasma Gun
|
|
Optical
|
Cooling water flow rate
|
|
180L/min
|
Cooling Tower
|
|
Water Pressure: 4kg/ cm2; Pressure Drop: 2kg/ cm2
|
Cooling Water
|
|
Inlet: 18℃; Outlet: 25℃; Standard: 20±1℃
|
Polycold
|
|
Option
|
Air Compressor
|
|
3HP (Air Pressure: 8 kg/ cm2) up
|
Grounding Resistance
|
|
Under 5Ω
|
Electrical Control System
|
|
PLC+ PC base (Windows System)
|
Total Power Requirement
|
|
110KW
|
Environment Requirement
|
Clean Room(ISO Class 5); Exopy Flooring; Air-conditioning; Temp.25±3℃; HUM50±10% |