Product Details

LP-1500BSPD Dual Door PVD Evap/ Sputtering Coater

  • Model:LP-1500BSPD
  • Specification:

Product Introduction

Features:
  • Dual chamber for independent loading operations.
  • Four kinds of coating process modes available foe selection.
  • Option: RF generators or magnetron sputtering source can be installed for surface coating.
  • LP-BSD series uses planetary rotation mechanism to achieve good film uniformity on curved surface substrates.
 
Application:
  • Decorative items
  • Cellphone housing
  • NCVM applications
  • Metallic finish
System/Model
LP- 1500 BSPD
Chamber Size
 
Diameter
1,500 mm
Height
1,500 mm
Capacity
-
∮135x1,250 x24
Main Performance
Ultimate Pressure
Better than 10-6 Torr
Operation Pressure
From 1 atm to 5x10-5 Torr within 10 minutes (unloading)
View Windows
Set
1
Number of Filaments
Pcs
20~24
Pumping System
Rotary Pump
6,000~10,000 L/min
Booster Pump
2,000~5,000 M3/ hour
Diffusion Pump
45000 L/ sec
Holding Pump
300~600 L/min (Optional)
Meissner Trap
-110 ~ -140 ℃
Vacuum Gauge
 
Pirani (760 ~10-3 Torr); Cold Cathode (10-3 ~ 10-6 Torr)
Control Box
Set
1
Evaporation Power Supply
 
35KW
Sputtering Target
Pcs
2~4
Evaporation Power Supply
 
RF or DC
System Operation
 
Automatic/ Manual
Cooling water flow rate
 
100 L/min
High Vacuum Valve
 
36 inch
Roughing Valve
 
6 inch
Foreline Valve
 
6 inch
Leak Valve
 
2 inch
Holding Valve (option)
 
1 inch
Cooling Tower
 
15 RT (Water Pressure: 4kg/ cm2; Pressure Drop: 2kg/ cm2)
Cooling Water
 
Inlet: 18℃; Outlet: 25℃; Standard: 20±1℃
Polycold
 
Option
Air Compressor
 
3HP (Air Pressure: 6 ~ 8 kg/ cm2)
Electrical Control System
 
PLC
Total Power Requirement
 
85KW
Environment Requirement
Clean Room(ISO Class 5); Exopy Flooring; Air-conditioning; Temp.25±3℃; HUM50±10%